1、IPC-A-600H-2010 印制板的可接受性 (中文版 ) 目录 Acknowledgment(鸣谢) . iii 1 Introduction(前 ) . 1 1.1 Scope(范围) . 1 1.2 Purpose( 的) . 1 1.3 Approach To This Document(本 件的使 法) . 1 1.4 Classification(产品分级) . 2 1.5 Acceptance Criteria(验收准则) . 2 1.6 Applicable Documents(引 件) . 4 1.6.1 IPC . 4 1.6.2 American Society of
2、 Mechanical Engineers(美国机械工程师协会) . 4 1.7 Dimensions and Tolerances(尺 与公差) . 5 1.8 Terms and Definitions(术语和定义) . 5 1.9 Revision Level Changes(版本修订变化) . 5 1.10 Workmanship( 艺质量) . 5 2 Externally Observable Characteristics (外部可观察特性) . 6 2.1 Printed Board Edges(印制板边缘) . 6 2.1.1 Burrs(毛刺) . 6 2.1.1.1 No
3、nmetallic Burrs(非金属毛刺) . 7 2.1.1.2 Metallic Burrs(金属毛 刺) . 8 2.1.2 Nicks(缺口) . 9 2.1.3 Haloing(晕圈) . 10 2.2 Base Material Surface(基材表 ) . 11 2.2.1 Weave Exposure(露织物) . 12 2.2.2 Weave Texture(显布纹) . 13 2.2.3 Exposed/Disrupted Fibers(暴露 /断裂的纤维) . 14 2.2.4 Pits and Voids(麻点和空 洞) . 15 2.3 Base Material
4、 Subsurface(基材表 下) . 16 2.3.1 Measling(白斑) . 21 2.3.2 Crazing(微裂纹) . 22 2.3.3 Delamination/Blister(分层 /起泡) . 24 2.3.4 Foreign Inclusions(外来杂夹物) . 26 2.4 Solder Coatings and Fused Tin Lead (焊料涂覆层和热熔锡铅层) . 28 2.4.1 Nonwetting(不润湿) . 28 2.4.2 Dewetting(退润湿) . 29 2.5 Holes Plated-Through General(镀覆孔 - 通
5、则) . 31 2.5.1 Nodules/Burrs(结瘤 /毛刺) . 31 2.5.2 Pink Ring(粉红圈) . 32 2.5.3 Voids Copper Plating(铜镀层空洞) . 33 2.5.4 Voids Finished Coating(最终涂覆层空洞) . 34 2.5.5 Lifted Lands (Visual)(焊盘起翘 (目检 ) . 35 2.5.6 Cap Plating of Filled Holes (Visual) (填塞孔的盖覆电镀 (目检) . 36 2.6 Holes Unsupported( 撑孔) . 38 2.6.1 Haloin
6、g(晕圈) . 38 2.7 Printed Contacts(印制接触 ) . 39 2.7.1 Surface Plating Plated Contacts (表面镀层 电镀的接触片) . 39 2.7.1.1 Surface Plating Wire Bond Pads (表面镀层 金属线键合盘) . 41 2.7.2 Burrs on Edge-Board Contacts (印制接触片 边缘毛刺) . 43 2.7.3 Adhesion of Overplate(外镀层附着力) . 44 2.8 Marking(标记) . 45 2.8.1 Etched Marking(蚀刻标记)
7、 . 48 2.8.2 Screened or Ink Stamped Marking (丝印或油墨盖印标记) . 50 2.9 Solder Mask(阻焊膜(阻焊剂) . 52 2.9.1 Coverage Over Conductors (Skip Coverage)(导体上的覆盖(跳印) . 53 2.9.2 Registration to Holes (All Finishes) (与孔的重合度(所有涂覆层) . 54 2.9.3 Registration to Other Conductive Patterns (与其它导电图形的重合度) . 55 2.9.3.1 Ball Gri
8、d Array (Solder Mask-Defined Lands) (球栅列阵(阻焊膜限定的焊盘) . 56 2.9.3.2 Ball Grid Array (Copper-Defined Lands) (球栅列阵(铜箔限定的焊盘) . 57 2.9.3.3 Ball Grid Array (Solder Dam) (球栅列阵(阻焊坝) . 58 2.9.4 Blisters/Delamination(起泡 /分层) . 59 2.9.5 Adhesion (Flaking or Peeling) (附着力(剥落或起皮) . 61 2.9.6 Waves/Wrinkles/Ripples(
9、波纹 /褶皱 /皱纹) . 62 2.9.7 Tenting (Via Holes)(掩蔽(导通孔) . 63 2.9.8 Soda Strawing(吸管状空隙) . 64 2.10 Pattern Definition Dimensional (图形精确度 - 尺 要求) . 66 2.10.1 Conductor Width and Spacing (导体宽度和间距) . 66 2.10.1.1 Conductor Width(导体宽度) . 67 2.10.1.2 Conductor Spacing(导体间距) . 68 2.10.2 External Annular Ring Mea
10、surement (外层环宽的测量) . 69 2.10.3 External Annular Ring Supported Holes (支撑孔的外层环宽) . 70 2.10.4 External Annular Ring Unsupported Holes (非支撑孔的外层环宽) . 72 2.11 Flatness(平整度) . 73 3 Internally Observable Characteristics (内部可观察特性) . 75 3.1 Dielectric Materials(介质材料) . 76 3.1.1 Laminate Voids/Cracks (Outside
11、 Thermal Zone) (层压板空洞 /裂缝(受热区外) . 76 3.1.2 Registration/Conductor to Holes (导体与孔的重 合度) . 78 Table of Contents( 录) IPC-A-600H-2010 2010年 4月 v 3.1.3 Clearance Hole, Unsupported, to Power/Ground Planes(电源层 /接地层上的非支撑孔,隔离孔) . 79 3.1.4 Delamination/Blister(分层 /起泡) . 80 3.1.5 Etchback(凹蚀) . 81 3.1.5.1 Etch
12、back(凹蚀) . 82 3.1.5.2 Negative Etchback(负凹蚀) . 84 3.1.6 Smear Removal(去钻污) . 85 3.1.7 Dielectric Material, Clearance, Metal Plane for Supported Holes(金属层上支撑孔的介质间距) . 87 3.1.8 Layer-to-Layer Spacing(层间间距) . 88 3.1.9 Resin Recession(树脂凹缩) . 89 3.1.10 Hole Wall Dielectric/Plated Barrel Separation (Hole
13、 Wall Pullaway)(孔壁介质与孔壁镀层 分离(孔壁拉脱) . 90 3.2 Conductive Patterns General(导电图形 - 总则) . 91 3.2.1 Etching Characteristics(蚀刻特性) . 94 3.2.2 Print and Etch(丝印及蚀刻) . 96 3.2.3 Surface Conductor Thickness (Foil Plus Plating)(表面导体厚度(铜箔加上镀层) . 97 3.2.4 Foil Thickness Internal Layers(内层铜箔厚度) . 98 3.3 Plated-Thr
14、ough Holes General(镀覆孔 - 总则) . 99 3.3.1 Annular Ring Internal Layers(内层环宽) . 101 3.3.2 Lifted Lands (Cross-Sections) (焊盘起翘(显微切片) . 103 3.3.3 Foil Crack (Internal Foil) C Crack (铜箔裂缝 (内层铜箔) C型裂缝) . 104 3.3.4 Foil Crack (External Foil) (铜箔裂缝(外层铜箔) . 105 3.3.5 Plating Crack (Barrel) E Crack (镀层裂缝(孔壁) E
15、型裂缝) . 106 3.3.6 Plating Crack (Corner) F Crack (镀层裂缝 (拐角) F型裂缝) . 107 3.3.7 Plating Nodules(镀层结瘤) . 108 3.3.8 Copper Plating Thickness Hole Wall (铜镀层厚度 孔壁) . 109 3.3.9 Copper Wrap Plating(铜包覆电镀) . 110 3.3.10 Plating Voids(镀层空洞) . 113 3.3.11 Solder Coating Thickness (Only When Specified)(焊料涂覆层厚度(仅当有
16、规定时) . 115 3.3.12 Solder Mask Thickness(阻焊膜厚度) . 116 3.3.13 Wicking(芯吸) . 117 3.3.13.1 Wicking, Clearance Holes(隔离孔的芯吸) . 118 3.3.14 Innerlayer Separation Vertical (Axial) Microsection (内层分离 垂直(轴向)显微切片) . 119 3.3.15 Innerlayer Separation Horizontal (Transverse) Microsection(内层分离 水平(横向) 显微切片) . 120 3
17、.3.16 Material Fill of Blind and Buried Vias (埋 /盲导通孔的材料填塞) . 121 3.3.17 Cap Plating of Filled Holes (填塞孔的盖覆电镀) . 123 3.4 Plated-Through Holes Drilled(镀覆孔 - 钻孔) . 125 3.4.1 Burrs(毛刺) . 126 3.4.2 Nailheading(钉头) . 127 3.5 Plated-Through Holes Punched(镀覆孔 - 冲孔) . 128 3.5.1 Roughness and Nodules(粗糙度和结瘤
18、) . 129 3.5.2 Flare(锥口) . 130 4 Miscellaneous(其他类型板) . 131 4.1 Flexible and Rigid-Flex Printed Boards (挠性及刚挠性印制板) . 132 4.1.1 Coverlay Coverage Coverfilm Separations (覆盖层覆盖 覆盖 膜分离) . 133 4.1.2 Coverlay/Covercoat Coverage Adhesives (覆盖层 /覆盖涂层的覆盖 粘接剂) . 134 4.1.2.1 Adhesive Squeeze-Out Land Area (焊盘区域
19、粘接剂的挤出) . 134 4.1.2.2 Adhesive Squeeze-Out Foil Surface (铜箔表面粘接剂的挤出) . 135 4.1.3 Access Hole Registration for Coverlay and Stiffeners(元器件孔与覆盖层及增强板 的重合度) . 136 4.1.4 Plating Defects(镀层缺陷) . 137 4.1.5 Stiffener Bonding(增强板的粘接) . 138 4.1.6 Transition Zone, Rigid Area to Flexible Area (刚性区域与挠性区域的过渡区) .
20、140 4.1.7 Solder Wicking/Plating Penetration Under Coverlay(覆盖层下的焊料芯吸 /镀层渗透) . 141 4.1.8 Laminate Integrity(层压板完整性) . 143 4.1.8.1 Laminate Integrity Flexible Printed Board (层压板完整性 挠性印制板) . 144 4.1.8.2 Laminate Integrity Rigid-Flex Printed Board (层压板 的完整性 刚挠性印制板) . 145 4.1.9 Etchback (Type 3 and Type
21、 4 Only)(凹蚀 (仅 3型和 4型板) . 146 4.1.10 Smear Removal (Type 3 and 4 Only)(去钻污 (仅 3型和 4型板) . 147 4.1.11 Trimmed Edges/Edge Delamination (裁切边缘 /边缘分层) . 148 4.1.12 Fold/Bend Marks(折叠 /弯曲痕迹) . 150 4.1.13 Silver Film Integrity(银膜完整性) . 151 4.2 Metal Core Printed Boards( 属芯印制板) . 153 4.2.1 Type Classificatio
22、ns(分类) . 154 4.2.2 Spacing Laminated Type(层压型板的间距) . 155 4.2.3 Insulation Thickness, Insulated Metal Substrate (绝缘型金属基板的绝缘厚度) . 156 4.2.4 Insulation Material Fill, Laminated Type Metal Core (层压型金属芯板的绝缘材料填充) . 157 4.2.5 Cracks in Insulation Material Fill, Laminated Type (层压型板绝缘材料填充中的裂缝) . 158 4.2.6 C
23、ore Bond to Plated-Through Hole Wall (金属芯与镀覆孔壁的连接) . 159 4.3 Flush Printed Boards(齐平印制板) . 160 4.3.1 Flushness of Surface Conductor (表面导体的平整性) . 160 5 Cleanliness(清洁度测试) . 161 5.1 Solderability(可焊性测试) . 162 5.1.1 Plated-Through Holes (Applicable to Test C/C1) (镀覆孔(适用于 C/C1 测试) . 163 5.2 Electrical Integrity(电 完整性) . 164 完整资料: https:/ 其它 IPC 标准( IPC-A-610, IPC-A-600, IPC-A-620 等)请联系: QQ:1395833280 Mail: cdm_
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