1、半导体界统计和R的应用,中芯国际 良率管理系统2008-12-13,Content,Background R Usage at SMIC,Integrated Circuit (IC) Manufacturing,1. IC Design,3. Fabricated Wafers,Semiconductor Data Flow,WAT,FT,WS/CP,WIP (MES, iEMS),Wafer start,Fab out,Continually Defect inspection and review:inspection tool KLA,compass) review tool: SEM
2、 Leica(OM),Continually ADI, AEI, CD,etc measurement called metrology (MES),MET,Defect(KLARF),WIP,EQ logdata,Test data,Process data,Also reliability, memory bit, QC and other data,Statisticians at SMIC,Reliability Analysis,Price,Time to Market,Original Yield Ramp,Our Mission:,Yield Analysis,R Usage a
3、t SMIC,1、线性模型/非线性模型/广义线性模型Linear model for inline monitor Basic mixed effect model applied to semiconductor dataVarious correlation analyses2、统计图形：阐述清楚统计原理与图形元素的对应关系Useful and interesting plots: histogram w/ splits, plot w/ table (Excel like), wafer map (3-D)3、非参数统计：各种基于秩的检验以及光滑方法Smooth spline usage
4、, EWMA Control Chart5、多元统计：一方面展示已有方法的应用，如主成分、聚类等，另一方面体现出R在矩阵运算方面的简便Wafer pattern classification: clustering analysis7、数据挖掘和机器学习: Logistic回归、kNN、以及神经网络、SVM等Logistic regression application9、程序接口：C/Fortran/C+/Java等或者R (D)COM、RservePython / VB / Delphi / mySQL linking with RR (D)COM under study,Climb th
5、e Mountain Peak of R, Fighting !,Thank you 谢谢,Q&A 请您提问,Linear Model for Inline Monitor,Inline analysis objectives Automatically examine ALL metrology items Alarm only significant trends and related equipment,WAT Uniformity Analysis (Mixed Effects Model Example),Problem Description: Break WAT paramet
6、ers variation into lot, wafer Highlight large or increasing variance contributors to better control the manufacturing process.,i: lot number 1,2,a; j: wafer number 1,2,b; k: site number 1,2,n.,Reference Book : Mixed Effects Models in S and S-Plus.,Analysis Method: Mixed Effects Model: three-level ne
7、sted linear model;Applied areas: agriculture, biology, economics, manufacturing & geophysics Using R (nlme), lot, wafer & die variance components are estimated.,WAT Uniformity Analysis Example Result,Other Correlation Analyses,Equipment Comparison,Queue Time,Interesting Plot 1,Histogram plot,Interes
8、ting Plot 2,Wafer Map,Smooth Spline Usage,Split,Reduce noise,Split control limitSmooth spline simulates the data for reducing noise,EWMA Control Chart,The Purpose of EWMA Control Chart: Detect data trend shift ;Reduce SPC X-bar charts excursion false alarm rate.,Cluster Analysis,Used “neural network
9、 like” methods,Illustrations for Single Wafer Analysis,Procedure Interface / Data Preparation,Procedure Interface : Python ( Perl ) / VB / Delphi / mySQL linking with R. ( Studying )Data Convert : Common use：reshape, merge, sort / order, apply, as.POSIXct. Purpose：match the format of SMIC data analysis systems .Data Clean : Wipe off the influential point , missing data .Purpose： prevent “ Garbage In , Garbage out ” .,
