1、化学英语证书考试（PEC）-化工机械术语AAlignment:The proper relative position accuracy of a graphic image, on an emulsion photo resist film mask with respect to an existing graphic image on a substrate.Alignment marks:Images selectively placed within or without an array for either testing, aligning or both.Angstrom()
2、:Unit definition used to define light wavelength, ultra-violet energy and x-rays; one angstrom is equivalent to 10- nanometers (1.0 10-10 meters).Artwork:An accurately scaled pattern which is used with producing the technical engineering drawing artwork photo master or photo mask(s); a product consi
3、sting of an image on the stable base surface. The proper description to define artwork and must include the required specification for tone and orientation; these specifications impact subsequent photo processing operations and/or usability.Artwork master:An accurate one to one pattern, usually a si
4、ngle image, which is what is used in producing the photomask(s). The proper description defining the artwork master must include the required specification for tone these specifications are what impact subsequent photo processing or CAD/CAM operations.BBackground:The surface area against which the p
5、attern is relieved. The surface area of the background is usually much greater than the area relieved.Backlighting:Viewing or photographing an object by placing it between a light-source onto which a strippable photosense is applied for use with producing phototools.Border Area:Region areas outside
6、the functional pattern area(s).Border Data:The data patterns which appear within the borders areas of phototooling; the patterns may include tooling hole bullseyes, identification, test, and registration marks.Bullseye:Stylized control pattern located within the borders areas of a (phototool or phot
7、omask or photo master) to assist in phototooling alignment and/or control registration.Burn In:To heat a printed image until the film resist coating becomes photo-sensitive etchant-resistant material or the burn in process utilized to complete fine line image developing of photoresist.CCAD:Computer
8、Aided DesigningThe integration of computers and programs to design products. The output can be graphics or a file list of coordinates and commands used in cnc machines for manufacturing the products.CAM:Computer Aided Manufacturing.The combined integration of cad to a cnc device is typical referred
9、to as cam or cad/cam.Camera Reduction:The process involved in photographically reducing the scaled artwork size; the product produced by such a process.Characteristic Curve:A curve, which D is plotted against Log E resulting from photographic plates exposed to a constant light I (power intensity) fo
10、r a series of time(time-scale exposures).Chatter:The sawtooth pattern along a cut line on artwork patterns caused by an uneven blade application while scribing the line cut.Chemical Etching:Selective stock removal from the base by chem etch, etching, chemmachining, electro chemical machining, or con
11、version of material by an electrochemical reaction procedure.Chemical Milling:Selective stock removal from the base by chem etch, chemical milling etchant, chemmachining, or conversion of material by an electrochemical reaction procedure.Clean Room:A room, with the environmental controls (temperatur
12、e and humidity) are maintained plus the environment is maintained pure “clean” free of contamination by HEPA filters or some other type of (HEPA) high efficiency small particle removal filters.CNC Machining:Acronym CNC: computer numerical control. Prior to using a computer in controlling machine too
13、ls it was simply, NC or numerical or numeric control.Coat:To cover or apply onto a substrate a photo resist film material coating as by dipping, rolling, spraying, laminating, spinning, or flow.Compensation:The compensation changes made in the dimensions on the master drawing from those specified on
14、 the engineering drawing allowing for chemmachining process variables, e.g., etch factor, etching undercut, etc.Composition:A photographic procedure, which have patterns on two separate substrates and are aligned or registered then transferred to a third substrate. This may be accomplished in conjun
15、ction with contact printing or cameras operations. The composition usually involves intermediate photo tools.Contact Printing:A photographic process, with images being transferred from one surface by light exposure to the photosense side of a second. The printed image orientation is dependent on the
16、 relative positioning of the surfaces; the tone is dependent on the photosensitive chemical matter used.Coordinatograph:An x and y coordinate photo plotting machine consisting of a fixed or rotating table b) optical as projected on a screen;c) photographic a photomask or the emulsion chemical on a f
17、ilm or plate;d) photo resist film exposed and developed coating on a substrate.Inclusions:Undesired materials in a solid matrix.Infrared:Electromagnetic energy usually defined as heat in the invisible light spectrum beyond the 7600A range. Inverse Square Law: illumination law which states that the s
18、urface illumination, via a point source is proportional to the source intensity and inversely proportional to the square distance from the source and the surface.JTHERE ARE NO (- J -) technical machining terms, terminology.KKeys:See engineering tech glossary: alignment mark.LLamination:A parts serie
19、s or etched blanks which are stacked and bonded with proper registration, forming a complete unit. lateral reversal: mirror image of the patterns geometric orientation.Layout:The composite patterns description, required to produce the functional pattern involving the phototooling, photo fabrication,
20、 or photo chemical machining.Legend:A lettering format or symbols on the part. e.g., part number, components locations, and patterns.Light:Electromagnetic energy defined as visible energy between 3800-7800 Angstrom range.Lumen:Luminous flux unit defined as total flux in a space angle of one steradin
21、, emitted by a one candela source (one candela emits 4 or 12.57 lumens.)Luminance (or Brightness):Flux reflected or emitted from a surface. The measurement has english units (foot lamberts) and metric units (candelas/square meter).Luminous Energy:Measurement for flux flow rate. The units are in lume
22、n seconds.Luminous Flux:Visible light energy flow measurement past any given point in space and is defined as the flux amount generated by a source (one candela into a solid angle of one steradian).MMachining:Process involved with removing, forming, shaping, turning, reducing, finishing, milling mat
23、erial (any type) by various processes (chemically mill, milling machine tool, or others).Marking:See technical glossary: legendMask:A selective barrier to the passage of radiation. Masks, metal on glass: An optical mask comprising a glass substrate selectively covered by thin, opaque metal layers, a
24、 photomask type.Master Drawing:The technical drawing for the etched blank whose documented dimensions include all compensations for the chemmachining process.Metal Hardening:A thermal, mechanical, or chemical engineering treatment used to increase the hardness of a metal.Milling:Process involved typ
25、ically with larger area removal of material (any type) by various processes (mill chemically, mill machine tool, or others).Misalignment:Improper relative image positioning. Molecular dye imaging materials: A particular diazo material sensitometrically designed for phototool applications by the manu
26、facturer.NNegative Acting Resist:A resist film which is polymerized (hardened) by light, and which, after exposure and development, remains on the substrate surface involving those areas which were under the transparent photomasks parts.Notch:A void; an undesirable indent within the photographic pat
27、terns edge, i.e., a clear indentation in a black pattern; a black indentation in a clear pattern.OOpacity:By definition, 1/T where T is transparency.Orientation:Definition: The manner in which the functional pattern is to be viewed. Proper orientation requires “right reading” definition. The orienta
28、tion for the various phototooling elements is described as either “right reading up” or “right reading down.”Orthochromatic:The emulsion silver component spectrally photo sensitive to blue, green, and yellow frequencies.Overlay:A film containing graphics material which is used for inspection by supe
29、rimposing the film on the graphics material.PPanchromatic:The emulsion silver component spectrally photo sensitive to the entire visual frequency spectrum portion (red, green, and blue).Pattern Information:See glossary information functional pattern.Patter Area:The designed configuration area which
30、includes the pattern and background. The pattern area bounds can be defined by a physical outline or by an imaginary outline formed by enclosing the pattern inside a box.Perpendicularity:Perpendicularity is measured by the degree to which the angle between the x-x AND y-y axis approaches a right ang
31、le.PhotoChemical Etching Fabrication (Photofabrication):The production of precise metal shapes and other substances by reproducing a precise photographic image on the surface of the substance method for incorporating physical features (holes, pins, bushings, targets, etc.) into the individual photot
32、ooling components to effect the desired registration.Photometry:Visible light intensity, energy measurement as it affects the human eye.Photo Plotting:Photographic procedures whereby an image is generated by a controlled lights beam motion and/or positioning by numerical control directly onto a ligh
33、t sensitive material (usually emulsion).Photoresist:A material which when properly applied to a substrate becomes sensitive to portions of the electromagnetic spectrum. When properly exposed and developed, substrate portions are masked with a high degree of integrity.Photoresist Hardening:The proces
34、s whereby photoresist is rendered more resistant to the plating effects AND/OR etching operations.Photo-Resist Integrity:The photoresist soundness measured using such terms as chemical resistance, uniformity measured in: power per unit area per solid area defined by the unit watt/square meter-sterad
35、ian.Radiant Energy:Measured in watts, reaching a given point accumulated over a given time interval, referred to as joules (watt-sec).Radiant Flux:The amount of power incident on a given surface expressed in watts.Radiant Intensity:The power from a point source generated in a solid angle: measured u
36、nits = watts/steradian.Radiometry:The radiation measurement involving the optical spectrum which includes ultraviolet, visible, & infrared light.Reciprocity Failure:Deviation from the reciprocity law. Typically, this deviation occurs at either low intensity or at short interval exposures & high inte
37、nsity and/or long interval exposure.Reciprocity Law:A general law for photochemical reactions which states that the photoproducts mass from such reactions are determined simply by the total exposure involved, i.e., by the product, intensity + time, which is independent of the two factors separately.
38、Reduction:See Camera Reduction.Reduction Marks:A stylized patterns set, located in the border area of an artwork between which the “photographic reduction dimension” is defined.Register Marks:Alignment marks or fiducials for registering the artwork.Registration:Alignment of artwork, materials, and l
39、ayers.Resist:See photoresist.Resolution, Usable:The smallest image which can be produced & subsequently processed in a given photo resist.Resolving Power:The photographic system ability to maintain, in the developed images, the separate identity of parallel bars when their relative displacement is s
40、mall.Reversal Development:A process used with certain emulsions for reversing the images tone from that which is accomplished with conventional developing. This process is carried out by developing the exposed silver halide, subsequently bleaching out the developed silver, then developing the remaining silver halide after an overall second exposure.Right Reading:A photo tool definition orientation which is the geometric image view as shown on the master.
